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Product

    ENERGYN CVI

    Chemical Vapor Infiltration

    The CVI and CVD equipment of Energyn is a type of equipment that perform surface adhesion, singular crystal formation, and chemical adhesion at a high temperature up to 3000℃.
    It can produce a singular crystal or make compound C-SiC or SiC-SiC materials through a CVI process on layered fiber.

    The characteristics of the ETGCVI of Energyn

    Densification processing equipment for compound materials

    This equipment is for the high-purity processing of C and C-SiC materials as well as the production of C-SiC composite of various forms. While conventional CVD machines coat only surfaces, the adhesion happens from the inside of the free-form material, which is to be produced through the artificial distribution of heat, through a CVD reaction. As a result, a product of high density and significant thickness can be achieved.

    ※ This machine can be used as the production equipment for C/C or RBSC (Reaction Bonded Silicon Carbide), etc.

    ~20kHz 250kW Induction Heating
    Max. 1900℃ PID Continuous Control
    Work Zone Dimension : Ø350mm X 500mmH
    MTS(Methyl-Trichloro-Silane) Supply System
    Gas Delivery System
    Integral Control by PLC & Touch Screen with HMI Function
    Safety Interlock

    Industrial areas

    Singular crystals (SiC, ZnSe, GaN)
    AlN/CC/CSiC, surface coating/infiltration, etc.

    ETGCVI-350

    Effective zone
    (hot zone, maximum dimensions of a product)
    Dia350 x 500H mm, vertical
    Driving Rotation (up to 10 rpm) and ascending/descending movements (up to 5mm/min, st500mm)
    Heat sources High-frequency induction heating (IGBT, 250kW, ~20kHz)
    TG CVI Reactor Quatz Tube
    SiC source MTS(methyltrichlorosilane) Vaporizer
    Equipment temperature Up to 1900℃, recommended 1300℃ (Option max. 3000℃)
    Vacuum level achieved 5x10E-4 torr
    Recommended pressure range 10~100torr (CDG measurement)
    Control of the injected gas 4 chanel MFC
    Control of exhaust gases Flow control vacuum valve
    Exhaust system The chemical resistant vacuum pump unit
    Control method SCADA, HMI
    Harmful gas sensors Cl and HCl detectors

      Application example

      04Furnace

      CVI/CVD